Microfabricated chip-scale rubidium plasma light source for miniature atomic clocks.
Identifieur interne : 000C08 ( Main/Exploration ); précédent : 000C07; suivant : 000C09Microfabricated chip-scale rubidium plasma light source for miniature atomic clocks.
Auteurs : RBID : pubmed:22481778Abstract
We present the microfabrication and characterization of a low-power, chip-scale Rb plasma light source, designed for optical pumping in miniature atomic clocks. A dielectric barrier discharge (DBD) configuration is used to ignite a Rb plasma in a micro-fabricated Rb vapor cell on which external indium electrodes were deposited. The device is electrically driven at frequencies between 1 and 36 MHz, and emits 140 μW of stable optical power while coupling less than 6 mW of electrical power to the discharge cell. Optical powers of up to 15 and 9 μW are emitted on the Rb D2 and D1 lines, respectively. Continuous operation of the light source for several weeks has been demonstrated, showing its capacity to maintain stable optical excitation of Rb atoms in chip-scale double-resonance atomic clocks.
DOI: 10.1109/TUFFC.2012.2214
PubMed: 22481778
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<record><TEI><teiHeader><fileDesc><titleStmt><title xml:lang="en">Microfabricated chip-scale rubidium plasma light source for miniature atomic clocks.</title><author><name sortKey="Venkatraman, Vinu" uniqKey="Venkatraman V">Vinu Venkatraman</name><affiliation wicri:level="1"><nlm:affiliation>Microsystems for Space Technologies Laboratory (LMTS), Ecole Polytechnique Fédérale de Lausanne (EPFL), Neuchâtel, Switzerland. vinu.venkat@epfl.ch</nlm:affiliation><country xml:lang="fr">Suisse</country><wicri:regionArea>Microsystems for Space Technologies Laboratory (LMTS), Ecole Polytechnique Fédérale de Lausanne (EPFL), Neuchâtel</wicri:regionArea></affiliation></author><author><name sortKey="Petremand, Yves" uniqKey="Petremand Y">Yves Pétremand</name></author><author><name sortKey="Affolderbach, Christoph" uniqKey="Affolderbach C">Christoph Affolderbach</name></author><author><name sortKey="Mileti, Gaetano" uniqKey="Mileti G">Gaetano Mileti</name></author><author><name sortKey="De Rooij, Nico F" uniqKey="De Rooij N">Nico F de Rooij</name></author><author><name sortKey="Shea, Herbert" uniqKey="Shea H">Herbert Shea</name></author></titleStmt><publicationStmt><date when="2012">2012</date><idno type="doi">10.1109/TUFFC.2012.2214</idno><idno type="RBID">pubmed:22481778</idno><idno type="pmid">22481778</idno><idno type="wicri:Area/Main/Corpus">000D89</idno><idno type="wicri:Area/Main/Curation">000D89</idno><idno type="wicri:Area/Main/Exploration">000C08</idno></publicationStmt></fileDesc><profileDesc><textClass></textClass></profileDesc></teiHeader><front><div type="abstract" xml:lang="en">We present the microfabrication and characterization of a low-power, chip-scale Rb plasma light source, designed for optical pumping in miniature atomic clocks. A dielectric barrier discharge (DBD) configuration is used to ignite a Rb plasma in a micro-fabricated Rb vapor cell on which external indium electrodes were deposited. The device is electrically driven at frequencies between 1 and 36 MHz, and emits 140 μW of stable optical power while coupling less than 6 mW of electrical power to the discharge cell. Optical powers of up to 15 and 9 μW are emitted on the Rb D2 and D1 lines, respectively. Continuous operation of the light source for several weeks has been demonstrated, showing its capacity to maintain stable optical excitation of Rb atoms in chip-scale double-resonance atomic clocks.</div></front></TEI><pubmed><MedlineCitation Owner="NLM" Status="PubMed-not-MEDLINE"><PMID Version="1">22481778</PMID><DateCreated><Year>2012</Year><Month>04</Month><Day>06</Day></DateCreated><DateCompleted><Year>2012</Year><Month>08</Month><Day>02</Day></DateCompleted><Article PubModel="Print"><Journal><ISSN IssnType="Electronic">1525-8955</ISSN><JournalIssue CitedMedium="Internet"><Volume>59</Volume><Issue>3</Issue><PubDate><Year>2012</Year><Month>Mar</Month></PubDate></JournalIssue><Title>IEEE transactions on ultrasonics, ferroelectrics, and frequency control</Title><ISOAbbreviation>IEEE Trans Ultrason Ferroelectr Freq Control</ISOAbbreviation></Journal><ArticleTitle>Microfabricated chip-scale rubidium plasma light source for miniature atomic clocks.</ArticleTitle><Pagination><MedlinePgn>448-56</MedlinePgn></Pagination><ELocationID EIdType="doi" ValidYN="Y">10.1109/TUFFC.2012.2214</ELocationID><Abstract><AbstractText>We present the microfabrication and characterization of a low-power, chip-scale Rb plasma light source, designed for optical pumping in miniature atomic clocks. A dielectric barrier discharge (DBD) configuration is used to ignite a Rb plasma in a micro-fabricated Rb vapor cell on which external indium electrodes were deposited. The device is electrically driven at frequencies between 1 and 36 MHz, and emits 140 μW of stable optical power while coupling less than 6 mW of electrical power to the discharge cell. Optical powers of up to 15 and 9 μW are emitted on the Rb D2 and D1 lines, respectively. Continuous operation of the light source for several weeks has been demonstrated, showing its capacity to maintain stable optical excitation of Rb atoms in chip-scale double-resonance atomic clocks.</AbstractText></Abstract><AuthorList CompleteYN="Y"><Author ValidYN="Y"><LastName>Venkatraman</LastName><ForeName>Vinu</ForeName><Initials>V</Initials><Affiliation>Microsystems for Space Technologies Laboratory (LMTS), Ecole Polytechnique Fédérale de Lausanne (EPFL), Neuchâtel, Switzerland. vinu.venkat@epfl.ch</Affiliation></Author><Author ValidYN="Y"><LastName>Pétremand</LastName><ForeName>Yves</ForeName><Initials>Y</Initials></Author><Author ValidYN="Y"><LastName>Affolderbach</LastName><ForeName>Christoph</ForeName><Initials>C</Initials></Author><Author ValidYN="Y"><LastName>Mileti</LastName><ForeName>Gaetano</ForeName><Initials>G</Initials></Author><Author ValidYN="Y"><LastName>de Rooij</LastName><ForeName>Nico F</ForeName><Initials>NF</Initials></Author><Author ValidYN="Y"><LastName>Shea</LastName><ForeName>Herbert</ForeName><Initials>H</Initials></Author></AuthorList><Language>eng</Language><PublicationTypeList><PublicationType>Journal Article</PublicationType><PublicationType>Research Support, Non-U.S. Gov't</PublicationType></PublicationTypeList></Article><MedlineJournalInfo><Country>United States</Country><MedlineTA>IEEE Trans Ultrason Ferroelectr Freq Control</MedlineTA><NlmUniqueID>9882735</NlmUniqueID><ISSNLinking>0885-3010</ISSNLinking></MedlineJournalInfo></MedlineCitation><PubmedData><History><PubMedPubDate PubStatus="entrez"><Year>2012</Year><Month>4</Month><Day>7</Day><Hour>6</Hour><Minute>0</Minute></PubMedPubDate><PubMedPubDate PubStatus="pubmed"><Year>2012</Year><Month>4</Month><Day>7</Day><Hour>6</Hour><Minute>0</Minute></PubMedPubDate><PubMedPubDate PubStatus="medline"><Year>2012</Year><Month>4</Month><Day>7</Day><Hour>6</Hour><Minute>1</Minute></PubMedPubDate></History><PublicationStatus>ppublish</PublicationStatus><ArticleIdList><ArticleId IdType="doi">10.1109/TUFFC.2012.2214</ArticleId><ArticleId IdType="pubmed">22481778</ArticleId></ArticleIdList></PubmedData></pubmed></record>Pour manipuler ce document sous Unix (Dilib)
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